ELECTRODEPOSITION OF SILICON ONTO GRAPHITERAO GM; ELWELL D; FEIGELSON RS et al.1981; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1981; VOL. 128; NO 8; PP. 1708-1711; BIBL. 8 REF.Article

PERIODIC FORMATION OF FESI BANDS IN DIFFUSION COUPLES FE (15 WT.% SI)-ZNOSINSKI K; VRIEND AW; BASTIN GF et al.1982; Z. METALLKD.; ISSN 0044-3093; DEU; DA. 1982; VOL. 73; NO 4; PP. 258-261; ABS. GER; BIBL. 8 REF.Article

SI DIFFUSION IN AP DURING IMPLANTATION AS PROBED BY THE (P,GAMMA ) RESONANCE BROADENING.ANTTILA A; HIRVONEN J.1976; THIN SOLID FILMS; NETHERL.; DA. 1976; VOL. 33; NO 2; PP. L13-L14; BIBL. 3 REF.Article

LATERAL DIFFUSION OF NI AND SI THROUGH NI₂SI IN NI/SI COUPLESZHENG LR; HUNG LS; MAYER JW et al.1982; APPLIED PHYSICS LETTERS; ISSN 0003-6951; USA; DA. 1982; VOL. 41; NO 7; PP. 646-649; BIBL. 11 REF.Article

STUDY OF SI SELF-DIFFUSION BY NUCLEAR TECHNIQUESDEMOND FJ; KALBITZER S; MANNSPERGER H et al.1983; PHYSICS LETTERS SECTION A; ISSN 0375-9601; NLD; DA. 1983; VOL. 93; NO 9; PP. 503-506; BIBL. 14 REF.Article

INFLUENCE DE NACL SUR LA SATURATION PAR DIFFUSION DU TUNGSTENE PAR LE SILICIUM SOUS VIDEZMIJ VI; GLUSHKO PI; TROFIMOV VF et al.1977; IZVEST. AKAD. NAUK S.S.S.R., NEORG. MATER.; S.S.S.R.; DA. 1977; VOL. 13; NO 10; PP. 1896-1897; BIBL. 8 REF.Article

IDENTIFICATION OF THE DOMINANT DIFFUSING SPECIES IN SILICIDE FORMATION.CHU WK; KRAUTLE H; MAYER JW et al.1974; APPL. PHYS. LETTERS; U.S.A.; DA. 1974; VOL. 25; NO 8; PP. 454-457; BIBL. 11 REF.Article

SELF-DIFFUSION OF ³⁰SI IN POLYCRYSTALLINE BETA -SICHON MH; DAVIS RF; NEWBURY DE et al.1980; J. MATER. SCI.; ISSN 0022-2461; GBR; DA. 1980; VOL. 15; NO 8; PP. 2073-2080; BIBL. 18 REF.Article

DETERMINATION OF THE DIFFUSING SPECIES AND MECHANISM OF DIFFUSION DURING CRSI₂ FORMATION, USING ³¹SI AS A MARKERBOTHA AP; PRETORIUS R; KRITZINGER S et al.1982; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1982; VOL. 40; NO 5; PP. 412-414; BIBL. 18 REF.Article

DETERMINATION PAR DIFFRACTION DE RAYONS X DES FACTEURS DE DIFFUSION ATOMIQUE, TEMPERATURES CARACTERISTIQUES, DEPLACEMENTS MOYENS DE V ET SI DANS V₃SISYIRATA MM; PALUCHANKYINA LP.1977; VESCI AKAD. NAVUK B.S.S.R., FIZ.-MAT. NAVUK; S.S.S.R.; DA. 1977; NO 6; PP. 102-105; ABS. RUSSE; BIBL. 18 REF.Article

CONDUCTIVITE PAR SAUTS DES SOLUTIONS SOLIDES DE SILICIUM DANS LE GERMANIUMGEL'MONT BL; GADZHIEV AR; SAKLOVSKIJ BI et al.1974; FIZ. TEKH. POLUPROVODN.; S.S.S.R.; DA. 1974; VOL. 8; NO 12; PP. 2377-2384; BIBL. 10 REF.Article

DIFFUSION CHARACTERISTICS OF BORON AND PHOSPHORUS IN POLYCRYSTALLINE SILICONBUONAQUISTI AD; CARTER W; HOLLOWAY PH et al.1983; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1983; VOL. 100; NO 3; PP. 235-248; BIBL. 15 REF.Article

SELF-DIFFUSION OF SILICON-30 IN ALPHA -SIC SINGLE CRYSTALSHONG JD; DAVIS RF; NEWBURY DE et al.1981; J. MATER. SCI.; ISSN 0022-2461; GBR; DA. 1981; VOL. 16; NO 9; PP. 2485-2494; BIBL. 19 REF.Article

THE DIFFUSION OF SILICON IN GERMANIUMRAISANEN J; HIRVONEN J; ANTTILA A et al.1981; SOLID-STATE ELECTRON.; ISSN 0038-1101; GBR; DA. 1981; VOL. 24; NO 4; PP. 333-336; BIBL. 17 REF.Article

INTERACTIONS IN THE CO/SI THIN-FILM SYSTEM. II. DIFFUSION-MARKER EXPERIMENTSVAN GURP GJ; VAN DER WEG WF; SIGURD D et al.1978; J. APPL. PHYS.; USA; DA. 1978; VOL. 49; NO 7; PP. 4011-4020; BIBL. 26 REF.Article

FREMDDIFFUSION VON METALLEN-BEITRAEGE VON MIKROSONDENVERFAHREN ZUR LOESUNG VON DIFFUSIONSPROBLEMEN. = DIFFUSION DE METAUX DANS D'AUTRES METAUX ET EMPLOI DE LA MICROSONDE ELECTRONIQUE POUR SON ETUDE.BERGNER D.1978; NEUE HUETTE; DDR; DA. 1978; VOL. 23; NO 6; PP. 233; BIBL. 1 REF.Article

EUTECTICS AND ALLOYS.1977; J. CRYST. GROWTH; NETHERL.; DA. 1977; VOL. 42; PP. 513-546; BIBL. DISSEM.; (INT. CONF. CRYST. GROWTH. 5; CAMBRIDGE, MASS.; 1977)Conference Paper

AUTODIFFUSION DU SILICIUM 30 DANS LA FORSTERITE MG₂SIO₄POUMELLEC BADIOLLE MICHELE.1979; ; FRA; DA. 1979; 104 P.-PL.; 30 CM; BIBL. 4 P.; TH. 3E CYCLE: GEOPHYS./PARIS 11/1979/2720; ILL.Thesis

INTERACTIONS IN THE CO/SI THIN-FILM SYSTEM. I. KINETICSLAV SS; MAYER JW; TU KN et al.1978; J. APPL. PHYS.; USA; DA. 1978; VOL. 49; NO 7; PP. 4005-4010; BIBL. 20 REF.Article

DIFFUSION DES ELEMENTS D'ALLIAGE DANS LE FER LIQUIDEERSHOV GS; KASATKIN AA; GAVRILIN IV et al.1978; IZVEST. AKAD. NAUK S.S.S.R., METALLY; S.S.S.R.; DA. 1978; NO 2; PP. 76-79; BIBL. 11 REF.Article

NEW SURFACE STRUCTURE ANALYSIS OF AG-SI PHASE BY QUANTITATIVE AUGER ELECTRON SPECTROSCOPY METHODTOKUTAKA H; NISHIMORI K; NOMURA S et al.1982; SURF. SCI.; ISSN 0039-6028; NLD; DA. 1982; VOL. 115; NO 1; PP. 79-90; BIBL. 18 REF.Article

A STUDY OF THE SI-AU-AG INTERFACE BY SURFACE TECHNIQUESCROS A; SALVAN F; DERRIEN J et al.1981; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1981; VOL. 52; NO 7; PP. 4757-4764; BIBL. 32 REF.Article

EFFECT OF COMPRESSIVE STRESS ON REACTION-DIFFUSION IN THE CU-SI SYSTEM.ONISHI M; MIURA H.1977; TRANS. JAP. INST. METALS; JAP.; DA. 1977; VOL. 18; NO 2; PP. 107-112; BIBL. 9 REF.Article

SUR LA DIFFUSION DU SILICIUM DANS LES COUCHES MINCES D'ALUMINIUM-CUIVRE DES CIRCUITS INTEGRESDUMOULIN P; MARCE P; MAYEUX A et al.1975; C.R. ACAD. SCI., C; FR.; DA. 1975; VOL. 281; NO 23; PP. 983-986; ABS. ANGL.; BIBL. 4 REF.Article

SILICON INFLUENCE ON DIFFUSION IN NICKEL-ALUMINIUM ALLOYSKOSITSYN SV; LITVINOV VS; SOROKIN VG et al.1980; FIZ. MET. METALLOVED.; ISSN 0015-3230; SUN; DA. 1980; VOL. 49; NO 5; PP. 1063-1067; BIBL. 14 REF.Article